Preparation of the deposition process and substrate loading at the EUV sputtering system Nessy III

Coating Devices

High-vacuum evaporation systems (ion-assisted electron beam evaporation, thermal boat evaporation)

  • substrate diameters up to 100 mm
  • materials: metals, metal oxides, metal fluorides, organic materials

 

Magnetron sputtering systems (including reactive sputtering)

  • substrate diameters up to 650 mm
  • materials: metals, metal oxides, indium tin oxide (ITO) layers, alloys (solder alloys), EUV multilayers

 

Atomic Layer Deposition tools

  • thermal and plasma enhanced ALD
  • substrate diameters up to 330 mm
  • materials: oxides, metals, tailored composites

 

 

Selected coating system

Coating system PRECICOAT – magnetron sputtering for precision optics