Preparation of the deposition process and substrate loading at the EUV sputtering system Nessy III

Coating Devices

  • High-vacuum evaporation systems Leybold SYRUS pro 1100, and APS 904 equipped with resistance heated and electron beam evaporators, optical monitoring systems OptiMon and plasma-ion sources APS
  • High-vacuum evaporation system Balzers BAK 640 for thermical evaporation of inorganic compounds
  • Sputtering system MRC I for evaporation of EUV-/x-ray coating systems for a substrate size up to 300 mm x 300 mm
  • Sputtering system MRC II, MRC III und MRC IV for evaporation of metal/dielectrical coatings/coating-systems for a substrate size up to 300 mm x 300 mm
  • Sputtering system NESSY I and NESSY II for evaporation of EUV-/x-ray coating systems for a substrate size up to ∅ 650 mm
  • Sputtering system PRECICOAT for evaporation of metal/dielectrical coatings/coating-systems for a substrate size up to 500 mm x 500 mm

 

Selected coating system

Coating system PRECICOAT – magnetron sputtering for precision optics