The interdisciplinary research group »Nano-SIS« is part of the Institute of Applied Physics at Friedrich Schiller University Jena. The goal of this project is the creation of a highly efficient solar cell concept by employing nanostructured »black silicon« at low production costs using SIS systems for cell fabrication.
To achieve a nanostructured surface, we use an inductively coupled plasma (ICP) etching process. The gas mixture during the process leads to high transparency and a specific resistivity.
A promising approach for rapid, simple and low cost fabrication of solar cells is the so called semiconductor - insulator - semiconductor (SIS) system. Here, a thin insulator is coated on doped silicon, followed by the deposition of a transparent conductive oxide (TCO).