We develop micro- and nanostructured optical elements with uncompromising precision for the most demanding photonic applications. Using lithographic processes such as grayscale and electron beam lithography, we develop and manufacture metasurfaces, diffraction gratings, CGHs and microlens arrays with nanometer precision on the wafer scale up to 300 mm. Replication techniques complement production for larger quantities. Our portfolio also includes active photonic integrated circuits (PICs) for quantum technology and telecommunications.