Micro and Nano-structuring

The creation and replication of optical microstructures and nanostructures is the basis for modern, complex optical systems. The existing technologies at the institute, including laser lithography, electron beam lithography and reactive ion etching enable the production and characterization of high-end micro-optical and nano-optical elements in the highest resolution on substrates up to 12”, including curved surfaces.

 

Photolithography

Lithographic processes enable the simultaneous production of a large number of elements with the highest lateral accuracy, a key requirement...
 

Grayscale lithography

With outstanding flexibility, direct writing grayscale lithography enables the generation of high precision microstructures for the implementation into optical systems...
 

Functional material printing

The printing of functional materials is manufacturing technology e.g. for polymer electronics, organic LED, solar cells and wiring that is resource...
 

Stochastic structures for antireflection

Stochastic structures arise fully through self-organization or are initiated by thin layers following plasma and ion beam exposure on materials...
 

Electron beam lithography

Micro- and nanostructured optics can be represented using lithography techniques, although the technical requirements on the lithography systems...
 

UV molding

UV molding is a cost-effective method of producing micro-optics on wafer scale. Here, a liquid polymer resin is UV-cured between a substrate...
 

Combination of lithography, dry etching and molding

The production of microlens arrays using photoresist reflow and following transfer with reactive ion etching (RIE) is an established technology...
 

Technologies for producing molding tools

The ultra-precision processing technology available at Fraunhofer IOF is equipped with the following systems...