Fraunhofer Institute for Applied Optics and Precision Engineering IOFThe focus of micro-optics technology is the lithographic generation of micro-optical structures and their replication for the realization of complex micro-optical components. These processes enable the parallel generation of a large number of laterally very precise aligned microlenses on substrates up to ⌀300 mm. A high degree in homogeneity targets large-area display and wafer-level optics applications. To a limited extend special substrates may be possible, too.
Advanced Microoptical Components
Your Partner for Origination, Prototyping und Small Series
Our expertise and the infrastructure are designed to support you in the origination of microstructures, the creation of functional prototypes, and small series production. We have established interfaces for data import as well as a network of industrial partners for subsequent process steps. A process transfer into your production chain is also possible.
Our Services and Competencies
In addition to regular lens arrays, photoresist reflow technique allows the adjustment of the size, orientation / arrangement of microlenses on a wafer, and the associated radius of curvature individually and independently of each other. Graytone photolithography enables array arrangements even of aspherical lenslets with an almost 100% aerial filling factor. Patterns of microprisms, Fresnel lenses, free-form elements, blazed gratings, or tailored light diffusers can also be created. Replication using UV molding allows the combination of a wide range of functionalities and the integration of lithographic-made apertures and filters into complex modules for miniaturized optics modules.
Utilizing plasma etch-transfer techniques, a large number of mentioned structures are also available for silica glass, borofloat glass, silicon, and germanium - thus addressing a wavelength range from UV to LWIR.
Examples for Microoptical Systems
Markets and Applications
Fly’s eye condeser with 3 zones of numerical aperture NA 0.1, 0.2, and 0.3 at constant focal length of 0.8mm. Double side polymer on glass replication.
We offer individual solutions, including:
- Laser / fiber collimation
- Refractive and diffractive beam shaping elements
- Homogenization of broadband sources
- Increasing the filling factor (and therefore detection efficiency) of focal plane arrays (FPA)
- Display technology: Field of view adjustment or 3D effect through light field principle
- Sensing technology: Miniaturized imaging optics, multi-channel imaging systems
Technical Infrastructure
In our clean room facility, we use commercial and partly in-house developed lithography, etching, and metrology technology
- Mask aligner for 100 mm to 300 mm substrates also suitable for replication and nano-imprint lithography
- Direct-writing gray-tone photolithography for structure heights from approx. 500 nm to 100 µm
- RIE plasma systems
- Tactile profilometry, white-light interferometry, laser-scanning microscopy, layer thickness mapping
- Camera measurement for functional testing of micro-optical beam shapers
- Interferometry of substrate surfaces and diffraction efficiency measurement
- Replication
Every year, selected research results from the previous year are published in the (Annual Report archive). Here you will find articles on developments in microlens arrays from the past few years:
- »Maskless micro-optical headlights«
(Annual Report 2024, page 30-31) - » Highly sensitive SPAD arrays using freeform microoptics«
(Annual Report 2022, page 30-31) - »Tailored-light diffusers for efficient illumination«
(Annual Report 2021, page 32-33) - »Microoptics enables Compact Quantum Optics Setups«
(Annual Report 2020, page 46-47) - »Imaging Grating Elements for Compact Spectrometers«
(Annual Report 2017, page 22-23) - »LaserFocusWorld 2021-09«
(LaserFocusWorld 2021-09
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