Fraunhofer Institute for Applied Optics and Precision Engineering IOFElectron beam lithography (EBL) is the central technology for the generation of micro- and nanostructures that go far beyond the requirements of classical microelectronics. At Fraunhofer IOF, we use EBL to develop and realize customized structures for state-of-the-art optical components, from meta-optics and photonic integrated circuits (PICs) to classical diffraction gratings and diffractive structures. Our many years of experience and high-end VISTEC SB350 OS system enable structures in the sub-65 nm range on large surfaces up to 300 mm in diameter.
Electron Beam Lithography
Maximum precision and flexibility for optics on both small and large surfaces
Our Services
We offer the complete process chain for the development and production of ultra-fine optical structures using electron beam lithography - from design consulting to characterization of the finished components. Thanks to state-of-the-art technology and our experienced team, we realize sophisticated individual structures and small series, adapted to the individual requirements of research and industry.
Benfits of Electron Beam Lithography
Electron beam lithography at Fraunhofer IOF offers unique advantages for the development and production of sophisticated optical micro- and nanostructures:
- Highest precision: Minimum structure size < 65 nm, address pitch 1 nm
- Positioning accuracy: <15nm (3δ)
- Large areas: Exposure of wafers up to 300 mm in diameter, special formats up to 15 mm thick
- Flexible geometries: Freely customizable layouts, complex designs, cell projection
- Efficient data processing: Fast implementation of complex patterns through pattern projection
EBL is a direct exposure process in which a focused electron beam selectively writes a radiation-sensitive layer (resist) onto the substrate. The controllable deflection of the beam allows the creation of arbitrarily complex 2D patterns with extremely high resolution. After the resist has been developed, the structure created serves as a template for transfer to the target material, usually by subsequent Plasma etching processes. EBL is particularly suitable for producing master structures for optical functional elements that cannot be achieved using standard lithography.
Schematic representation of the structuring process
