Computer-generated Holograms for Surface Measurement

Optics Design and Data Generation

We develop optics designs that precisely match your measurement tasks - from single to double mirrors, round or square. In addition to the pure optical surface, we integrate alignment structures for CGH and mirror alignment to ensure fast, reproducible alignment and maximum measurement accuracy.

Our innovative data generation for the lithographic production of CGHs uses both our own designs and your specifications as input. Provide us with your CGH designs as a phase function - we convert them into the required binary structure using our own, continuously developed algorithms.

Substrate refinement

For precision measurements of surfaces, minimizing errors in the initial substrates is of great importance. We can measure our substrates interferometrically before lithographic processing and correct them with ion beam processing. A standard correction is an improvement of the transmitted wavefront to < 10 nm RMSt over the aperture used.

Lithographic Production

A unique selling point of our electron beam lithography system is the low positioning error of the structures over the entire substrate size (< 20 nm (3σ)). This accuracy is particularly essential for surface measurement applications. For etch transfer, standard processes exist for mask blanks of size 6“ and 9” (152mm x 152mm x 6.35mm and 230mm x 230mm x 9mm). The etch depth of the binary structures is selected so that the 0th diffraction order is suppressed.

If required, the CGHs can also be manufactured with more than two height levels in order to increase the efficiency of the diffracted wave.