Replication of micro-optical structures using UV molding

Your Partner for Origination, Prototyping, and Small Series

Our expertise and infrastructure are designed to support you in realizing functional prototypes and small series production. We have the capability of lithographic-based origination and patterning processes as well as a network of industrial partners for subsequent process steps. We evaluate and qualify your specific imprint polymer regarding processability, optical properties such as refractive index measurement or transmission characterization, and coatability. We assist you in transferring this process into your production chain. 

Our Services and Expertise

UV molding as replication technology enables the fusion of different optical functions like lithographic aperture and filter structures into complex miniaturized optical modules and assemblies. We use commercial materials from diverse polymer classes, such as acrylates, epoxies, Ormocers, and silicones. Glass and semiconductor substrates from 100 microns to several millimeters thickness can be used up to a wafer diameter of 300 mm (12").

In addition to the full-wafer processing of single- and double-sided micro-optics further variants have been developed like achromatic doublets or the selective UV curing of the polymer only in localized areas of the substrate. The latter enables the molding of optical microstructures only onto emitter or receiver arrays, while peripheral areas for back-end processes such as die separation or wire bonding remain free of polymer.

Markets and Applications

UV molding is established in applications where the precision or stability of all-polymer optics is not sufficient. We offer individual solutions including:

• Collimation of laser or fiber arrays
• Diffractive optical elements (DOE) such as beamshapers and blazed gratings
• Wafer-level optics for miniature cameras and sensors
• Microoptics directly on CMOS-Si wafers
• Optical filling factor increment (and thus detection efficiency) of receiver arrays

Technical Infrastructure

In our clean room facility, we use commercial and partly in-house developed lithography, etching, and metrology technology

• Mask aligner devices for 100 mm to 300 mm substrates suitable for replication and nano-imprint lithography
• Metrology based on tactile profilometry, white-light interferometry, laser-scanning microscopy
• Camera measurement for functional testing of micro-optical beam shapers
• Refractive index measurement based on waveguide mode propagation for discrete wavelengths VIS – NIR
• Spectro-photometer UV – SWIR for transmission and reflectance measurement
• Reflector coatings (enhanced metal) or anti-reflection coatings
• Separation utilizing wafer dicing saw or ultrasonic milling

Our Research Strength

• »Maskless micro-optical headlights«
  (Annual Report 2024, Page 30-31)
• »Highly sensitive SPAD arrays using freeform microoptics«
  (Annual Report 2022, Page 30-31)
• »Tailored-light diffusers for efficient illumination«
  (Annual Report 2021, Page 32-33)
• »Mikrooptische Elemente für kompakte Quantenoptische Systeme«
  (Annual Report 2020, Page 46-47)
• »Imaging Frating Elements for Compact Spectrometers«
  (Annual Report 2017, Page 22-23)