Atomic Layer Deposition for Optical Coatings

The advantages of ALD are:

• conformal thin film growth on nano/ microstructured substrates such as gratings,
  porous membranes or on substrates with a complex shape such as lenses, fibers, half-dome, etc.
• tailored material properties by composite materials and nanolaminates
• sub-nanometer precision thickness control
• low surface roughness
• high uniformity
   
  

We offer a wide range of materials and carry out custom material development upon request:

• Organic or hybrid organic-inorganic MLD coatings (molecular layer deposition)
• Composite materials with tailored composition and properties
• Oxides (TiO₂, Ta₂O₅, HfO₂, Al₂O₃, SiO₂)
• Nanoporous oxides (SiO₂, Al₂O₃)
• Doping of thin films
• Nanolaminates
• Metals (Ir, Ru)
• Nitrides

Additionally we have several characterization and material treatment capabilities including:
 

• Spectrophotometry, ellipsometry, XRR, XRD, AFM, SEM, etc.
• Thermal stability and annealing
• Chemical stability and wet chemical etching
• Handling substrates under inert atmosphere for moisture sensitive substrates

We can support your applications by applying functional ALD coatings for:
 

• interference coating systems such as bandpass filters, beam splitters, polarisers, mirrors etc.
• antireflective coatings
• X-ray optics
• photonic crystals
• polarizers
• diffractive optical elements
• high efficiency transmission or reflection gratings
• guided mode resonance gratings (resonant waveguides)
• filling grooves of nanostructured materials
• biocompatible or antibacterial surfaces
• hydrophobic or hydrophilic coatings
• barrier and protective coatings
• diffusion membranes
• encapsulation, coating fibres, metamaterials, sensors etc.

Your substrate & our coating
Make the difference!