Grayscale Lithography

News on grayscale lithography at Fraunhofer IOF


For faster and easier production of freeform micro-optics

The system series "HighFive" for highly dynamic grayscale lithography was developed at Fraunhofer IOF. In close cooperation with industry, the next generation system "HighFive-C" was realized.

High precision microstructures on various substrates

With outstanding flexibility, direct writing grayscale lithography enables the generation of high precision microstructures for the implementation into optical systems.Thus, individual solutions for refractive and diffractive micro optical elements, even on non-standard or non-flat surfaces, can be realized in close collaboration with design and integration.


Technical Data

  • Lithography system specially designed for generation of micro optical elements
  • High dynamic dosage control at 405 nm exposure wavelength
  • Maximum writing field size: 0.5 × 0.5 m2
  • Patterning of slowly curved substrates

Typical Applications

  • Efficient (blazed) gratings und CGHs
  • Spherical or aspherical lenses and dense lens arrays in regular or chirped arrangement
  • Beam shaping elements
  • Diffractive correction lenses for spherical and chromatic aberrations
  • Deterministic diffractive-refractive-hybrid diffusors
  • Prismatic optical elements and retroreflectors
  • Micro-freeform surface profiles
  • (Multi-level) Lithography on almost every material and substrate geometry

Have we aroused your interest?

Then contact us.
We also develop customized solutions for industry and science in the field of gray tone lithography.

We research and develop on behalf of industry and science

If you have any questions regarding the cooperation with Fraunhofer IOF, please find further information under the following link:

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