Electron Beam Lithography

Micro- and nanostructured optics can be represented using lithography techniques, although the technical requirements on the lithography systems and process significantly deviate from those of microelectronics and in many respects exceed them.

The Fraunhofer IOF has many years of experience in the field of developing exacting micro- and nanostructures.

Key technologies are electron beam lithography for generating prototypes and transfer processes proceeding from the prototype (structure transfer with etching processes) and their replication (structure transfer with nano-molding).

The available technological facilities enable the efficient realization of such structures on surfaces of up to 300 mm expansion with the highest precision and resolution.